Photo Mask Dry Etching Equipment for Research and Development Purposes
A must-see for those involved in the new development of photomasks! A dry etching device with a compact design that can process photomasks and wafers of various sizes.
We would like to introduce our "RIE Dry Etching Equipment for Photomasks." By adopting a "shuttle" as the carrier for photomasks, it is possible to process various sizes of photomasks simply by replacing the "shuttle," without the need to change the hard wafer. We offer both open load and load lock types, and with the load lock type, it is possible to etch MoSi, Cr, and Ta materials in a single chamber. 【Features】 ■ Compact design ■ Easy cleaning of the reactor interior through plasma cleaning ■ Use of liners to prevent contamination within the reactor chamber ■ Easy to remove due to the plug-in design *For more details, please download the PDF (English version) or feel free to contact us.
- 企業：プラズマ・サーモ・ジャパン
- 価格：Other
